Optical characteristics of UV-LED with subwavelength grating

被引：0
作者：
Takashima, Yuusuke [1 ]
Haraguchi, Ryo Shimizu Masanobu [1 ]
Naoi, Yoshiki [1 ]
机构：
[1] Univ Tokushima, Tokushima 7708506, Japan
来源：
2013 18TH MICROOPTICS CONFERENCE (MOC) | 2013年
关键词：
D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Subwavelength grating structure with a thickness of 150nm was fabricated on ultraviolet light emitting diode by using electron beam lithography and inductively coupled plasma (ICP) etching. For an optimal designed period, the subwavelength grating exhibit high polarization selectivity for the wavelength from 365nm to 400nm. Especially, a polarization ratio (TE/TM) of 3.5 was achieved for 365nm. Applying this characteristics, we demonstrated highly polarized UV-LED.
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