Electronic Properties of Vanadium-Doped TiO2

被引:24
作者
Islam, Mazharul M. [1 ,2 ]
Bredow, Thomas [1 ]
Gerson, Andrea [2 ]
机构
[1] Univ Bonn, Inst Phys & Theoret Chem, D-53115 Bonn, Germany
[2] Univ S Australia, Mawson Inst, Adelaide, SA 5001, Australia
关键词
density functional calculations; doping; electronic properties; TiO2; vanadium; VISIBLE-LIGHT RESPONSE; ION-IMPLANTED TIO2; PHOTOCATALYTIC ACTIVITY; TITANIUM-DIOXIDE; OPTICAL-PROPERTIES; RUTILE; WATER; DEGRADATION; ANATASE; SURFACES;
D O I
10.1002/cphc.201100557
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electronic properties of vanadium-doped rutile TiO2 are investigated theoretically with a HartreeFock/DFT hybrid approach. The most common oxidation states (V2+, V3+, V4+, and V5+) in different spin states are investigated and their relative stability is calculated. The most stable spin states are quartet, quintet, doublet, and singlet for V2+, V3+, V4+, and V5+ doping, respectively. By comparing the formation energy with respect to the parent oxides and gas-phase oxygen (?E), we conclude that V4+ (?E=145.3 kJ?mol-1) is the most likely oxidation state for vanadium doping with the possibility of V5+ doping (?E=283.5 kJ?mol-1). The energetic and electronic properties are converged with dopant concentrations in the range of 0.9 to 3.2?%, which is within the experimentally accessible range. The investigation of electronic properties shows that V4+ doping creates both occupied and unoccupied vanadium states in the band gap and V5+ doping creates unoccupied states at the bottom of the conduction band. In both cases there is a significant reduction of the band gap by 0.65 to 0.75 eV compared to that of undoped rutile TiO2.
引用
收藏
页码:3467 / 3473
页数:7
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