Cell-to-Cell Fundamental Variability Limits Investigation in OxRRAM Arrays

被引:12
作者
Grossi, Alessandro [1 ]
Zambelli, Cristian [1 ]
Olivo, Piero [1 ]
Nowak, Etienne [2 ]
Molas, Gabriel [2 ]
Nodin, Jean Francois [2 ]
Perniola, Luca [2 ]
机构
[1] Univ Ferrara, Dipartimento Ingn, I-44122 Ferrara, Italy
[2] CEA Leti, Minatec Campus, F-38054 Grenoble, France
关键词
OxRRAM; HfO2; variability; QPC model; HFO2-BASED RRAM; IMPACT; MODEL;
D O I
10.1109/LED.2017.2774604
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, the fundamental variability limits of filament-based OxRRAM are investigated considering different transistor sizes and metal-insulator-metal (MIM) stacks featuring different materials and thicknesses. Cell-to-cell variability is analyzed through an extensive characterization of Forming, Set, and Reset operations on 4-kb OxRRAM arrays. The results obtained in terms of switching voltage variability and resistance variability from cell-to-cell are compared and discussed to identify the variability limiting component as a function of the conduction regime and to understand the impact of transistor MIM stack parameters on variability and performances.
引用
收藏
页码:27 / 30
页数:4
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