Removal of self-assembled monolayers of alkanethiolates on gold by plasma cleaning

被引:104
作者
Raiber, K
Terfort, A
Benndorf, C
Krings, N
Strehblow, HH
机构
[1] Univ Hamburg, Inst Anorgan & Angew Chem, D-20146 Hamburg, Germany
[2] Univ Hamburg, Inst Phys Chem, D-20146 Hamburg, Germany
[3] Univ Dusseldorf, Inst Phys Chem & Elektrochem 2, D-40225 Dusseldorf, Germany
关键词
self-assembled monolayers (SAMs); thiols; gold; plasma processing; X-ray photoelectron spectroscopy; ellipsometry; contact angle; micro-contact printing (mu CP);
D O I
10.1016/j.susc.2005.07.038
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Plasmas of hydrogen or oxygen were used to remove self-assembled monolayers (SAMs) of alkanethiolates from gold surfaces. X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), ellipsometry, and contact angle measurements were used to compare the efficiency of the different plasmas and to explore their respective influence on the surface topology. Both plasmas were able to remove the SAM from the gold surface within less than 60 s. While the hydrogen plasma produces a de facto sulfur-free surface, oxygen plasma cleaning leads to an Au2O3 surface contaminated with oxidized sulfur species (probably sulfonates and sulfate). Nevertheless, the plasmas alter the roughness of the gold surfaces only marginally, as demonstrated by STM. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:56 / 63
页数:8
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