The Road for 2D Semiconductors in the Silicon Age

被引:187
作者
Wang, Shuiyuan [1 ]
Liu, Xiaoxian [1 ]
Zhou, Peng [1 ,2 ]
机构
[1] Fudan Univ, ASIC & Syst State Key Lab, Sch Microelect, Shanghai 200433, Peoples R China
[2] Fudan Univ, Frontier Inst Chip & Syst, Shanghai Frontier Base Intelligent Optoelect & Pe, Inst Optoelect, Shanghai 200433, Peoples R China
基金
中国国家自然科学基金;
关键词
2D devices; heterogeneous integration; in-memory computing; in-sensor computing; silicon integrated circuits; TRANSITION-METAL DICHALCOGENIDES; FIELD-EFFECT TRANSISTORS; LARGE-AREA SYNTHESIS; NEGATIVE CAPACITANCE; 2-DIMENSIONAL MATERIALS; MONOLAYER MOS2; LOW-POWER; GRAPHENE FILMS; HIGH-QUALITY; SOI MOSFETS;
D O I
10.1002/adma.202106886
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Continued reduction in transistor size can improve the performance of silicon integrated circuits (ICs). However, as Moore's law approaches physical limits, high-performance growth in silicon ICs becomes unsustainable, due to challenges of scaling, energy efficiency, and memory limitations. The ultrathin layers, diverse band structures, unique electronic properties, and silicon-compatible processes of 2D materials create the potential to consistently drive advanced performance in ICs. Here, the potential of fusing 2D materials with silicon ICs to minimize the challenges in silicon ICs, and to create technologies beyond the von Neumann architecture, is presented, and the killer applications for 2D materials in logic and memory devices to ease scaling, energy efficiency bottlenecks, and memory dilemmas encountered in silicon ICs are discussed. The fusion of 2D materials allows the creation of all-in-one perception, memory, and computation technologies beyond the von Neumann architecture to enhance system efficiency and remove computing power bottlenecks. Progress on the 2D ICs demonstration is summarized, as well as the technical hurdles it faces in terms of wafer-scale heterostructure growth, transfer, and compatible integration with silicon ICs. Finally, the promising pathways and obstacles to the technological advances in ICs due to the integration of 2D materials with silicon are presented.
引用
收藏
页数:22
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