Discharge characteristics of MgO and MgO-ZrO2 protective films prepared by electron beam evaporation

被引:12
作者
Kim, R [1 ]
Kim, Y [1 ]
Park, JW [1 ]
机构
[1] Hanyang Univ, Dept Met Engn, Seoul 133791, South Korea
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 83卷 / 1-3期
关键词
MgO-ZrO2; film; protective layer; firing voltage; memory coefficient; plasma display panel;
D O I
10.1016/S0921-5107(00)00796-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to improve both the operating voltage and the memory coefficient (MC) of a protective layer for AC plasma display panels, controlled amount of ZrO2 was added to the pure MgO. The effects of the ZrO2 addition on both the electrical properties (V-f and V-s) and the microstructure of the Mg2-2NZrxO2 films deposited by e-beam evaporation were investigated. As the [ZrO2/(MgO + ZrO2)] ratio of the protective materials increased, the oxygen content in films increased and the relative ratio of (200)/(111) also increased with overall peak shifting to lower angular diffraction positions. The firing voltage of the MgO-ZrO2 protective films, when the [ZrO2/(MgO + ZrO2)] ratio was 0.1, was 5% lower than that of the conventional MgO protective films with higher MC. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:55 / 60
页数:6
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