Superlens-enhanced laser interference lithography

被引：15

作者：

Guo, Xudong ^{[1
]}

Li, Li ^{[1
]}

Hu, Yaowei ^{[1
]}

Cao, Liang ^{[1
]}

Dong, Litong ^{[1
]}

Wang, Lu ^{[1
]}

Ding, Ran ^{[1
]}

Weng, Zhankun ^{[1
]}

Song, Zhengxun ^{[1
]}

Xu, Hongmei ^{[1
]}

Yang, Zhen ^{[2
]}

Liu, Xianping ^{[2
]}

Tian, Yanling ^{[2
]}

Wang, Zuobin ^{[1
]}

机构：

[1] Changchun Univ Sci & Technol, Int Res Ctr Nano Handling & Mfg China CNM, Changchun 130022, Jilin, Peoples R China

[2] Univ Warwick, Sch Engn, Coventry CV4 7AL, W Midlands, England

来源：

APPLIED PHYSICS EXPRESS | 2018年 / 11卷 / 12期

基金：

欧盟地平线“2020”; 国家重点研发计划;

关键词：

BEAM LITHOGRAPHY; SILICON; FABRICATION; FILMS; NANOSTRUCTURES; GRATINGS; ABLATION;

D O I：

10.7567/APEX.11.125201

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A one-step lithography method based on a superlens is proposed to fabricate diffraction-unlimited metallic patterns. By controlling the material parameters and the distribution of the impinging energy, various phenomena, such as periodic nanonetworks, ultrathin nanowires (sub-50-nm feature size), and variable-sized nanoparticles (ranging from sub-10 nm to several hundreds of nanometers), are fabricated using a 1,064-nm nanosecond laser. The evolution pathway of such phenomena is explained by the dewetting process of metallic films. The direct-writing performance of a transparent material with a superlens is studied, and the maximum etching depth of Si gratings can reach 2 mu m under a single laser pulse, with fine profiles. (C) 2018 The Japan Society of Applied Physics.

引用

页数：5

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