Modeling, optimization, and comparative analysis of trivalent chromium electrodeposition from aqueous glycine and formic acid baths

被引:65
作者
Baral, A [1 ]
Engelken, R
机构
[1] Arkansas State Univ, Coll Engn, State Univ, AR 72467 USA
[2] Arkansas State Univ, Environm Sci Program, State Univ, AR 72467 USA
关键词
D O I
10.1149/1.1933688
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Trivalent chromium electrodeposition has been studied as an alternative to hazardous hexavalent chromium electroplating. Although limited by inability to deposit thick coatings with acceptable quality, it is useful for decorative chromium electroplating. In the present work, we illustrate the application of statistical design of experiments (DOE) in empirical modeling and optimization of electrodeposition of trivalent chromium from baths of chromium complexed with glycine. DOE shows that variations in current efficiency with glycine and chromium chloride concentrations can be explained by a quadratic model. The composition of the bath was optimized with respect to current efficiency to obtain faster deposition. We compare the effects of process parameters (pH, temperature, current density, and pulsed current) on current efficiency and deposit characteristics for both glycine and formic acid-containing baths. Experiments reveal that whether pulsed current increases or decreases current efficiency is determined by how current density influences current efficiency, and the range of lower and upper current density levels. (c) 2005 The Electrochemical Society. All rights reserved.
引用
收藏
页码:C504 / C512
页数:9
相关论文
共 25 条
[1]   Kinetics and mechanism of chromium electroplating from Cr(III) baths [J].
Danilov, FI ;
Protsenko, VS .
PROTECTION OF METALS, 2001, 37 (03) :223-228
[2]   ELECTRODEPOSITION OF COBALT-CHROMIUM ALLOY FROM TRIVALENT CHROMIUM SOLUTIONS [J].
DASARATHY, H ;
RILEY, C ;
COBLE, HD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (07) :1773-1779
[3]  
DEYRUP AJ, 1961, Patent No. 2801823
[4]  
DEYRUP AJ, 1965, Patent No. 981481
[5]  
Edigaryan AA, 1998, PROT MET+, V34, P95
[6]   Electrodeposition of thick chromium coatings from an environmentally acceptable chromium (III)-glycine complex [J].
El-Sharif, M ;
McDougall, J ;
Chisholm, CU .
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1999, 77 :139-144
[7]   PULSE PLATING OF CHROMIUM-COBALT ALLOYS CONTAINING A PHASE WITH THE A-15 STRUCTURE [J].
GELCHINSKI, MH ;
GALOR, L ;
YAHALOM, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) :2433-2438
[8]  
GIANELOS L, 1982, PLAT SURF FINISH, V69, P30
[9]  
HAYASHI T, 1979, PLAT SURF FINISH, V66, P36
[10]  
HSIEH AK, 1993, MET FINISH, V91, P45