Full InGaN red (625 nm) micro-LED (10 μm) demonstration on a relaxed pseudo-substrate

被引:69
作者
Dussaigne, Amelie [1 ]
Le Maitre, Patrick [1 ]
Haas, Helge [1 ]
Pillet, Jean-Christophe [1 ]
Barbier, Frederic [1 ]
Grenier, Adeline [1 ]
Michit, Nicolas [1 ]
Jannaud, Audrey [1 ]
Templier, Roselyne [1 ]
Vaufrey, David [1 ]
Rol, Fabian [1 ]
Ledoux, Olivier [2 ]
Sotta, David [2 ]
机构
[1] Univ Grenoble Alpes, CEA, LETI, Minatec Campus, F-38054 Grenoble, France
[2] Soitec SA, F-38190 Bernin, France
关键词
InGaN; red micro-LED; InGaN pseudo-substrate; full InGaN structure; InGaNOS;
D O I
10.35848/1882-0786/ac1b3e
中图分类号
O59 [应用物理学];
学科分类号
摘要
The full InGaN structure was grown on two different InGaNOS substrates from Soitec. An electron blocking layer was inserted in the full InGaN light emitting diode (LED). Enhanced internal quantum efficiency of red emitting InGaN/InGaN quantum wells was measured with a value above 10% at 640 nm. 10 mu m diameter circular micro-LEDs are emitted at 625 nm with an external quantum efficiency of 0.14% at 8 A cm(-2) with an estimated light extraction efficiency below 4%. With a a lattice parameter of 3.210 angstrom, InGaN based red LED can also emit up to 650 nm.
引用
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页数:5
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