Optical Properties of Vanadium and Nitrogen Doped 4H and 6H-SiC

被引:0
|
作者
Huang, Zhiming [1 ]
Huang, Jingguo [1 ]
Gao, Yanqing [1 ]
Andreev, Yury M. [2 ,3 ,4 ]
Ezhov, Dmitry M. [2 ]
Svetlichnyi, Valery A. [2 ,4 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Shanghai, Peoples R China
[2] Tomsk State Univ, Siberian Phys Tech Inst, Tomsk, Russia
[3] RAS, Inst Monitoring Climat & Ecol Syst SB, Tomsk, Russia
[4] RAS, High Current Elect Inst, Tomsk, Russia
基金
俄罗斯科学基金会;
关键词
Silicon Carbide; THz; optical damage threshold; SILICON-CARBIDE; NONLINEAR MATERIAL; CRYSTALS; REGION; FILMS;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Linear optical properties of vanadium (V) and nitrogen (N) doped single-crystal sub-millimeter wafers of 4H-SiC and 6H-SiC grown for industrial applications in optics and electronics are studied in detail within transparency window and from 0.2 THz to 2.1 THz range to reveal usability in parametric frequency conversion. Manufactured wafers are found not uniform in polytype composition. Optical properties of majority of wafers indicated applicability for THz wave generation by optical rectification method. The wafers demonstrated large optical damage threshold exceeding that for widely used crystals GaSe at least for from 3 to 5 times and up to 10 times lower (from a few tens to below 1 cm(-1)) absorption coefficient in the THz range. Birefringence of doped 4H-SiC are still close to that for pure crystals, i.e. suitable for phase matched frequency conversion within the transparency window or into the THz region. Polytypc 6H seems suitable for phase matched down-conversion into the THz range. Nevertheless, absolute values of refractive indices are seriously varying wafer to wafer.
引用
收藏
页码:314 / 319
页数:6
相关论文
共 50 条
  • [1] Electrical and optical characterisation of vanadium in 4H and 6H-SiC
    Lauer, V
    Brémond, G
    Souifi, A
    Guillot, G
    Chourou, K
    Anikin, M
    Madar, R
    Clerjaud, B
    Naud, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 61-2 : 248 - 252
  • [2] Nitrogen implantation in 4H and 6H-SiC
    Gimbert, J
    Billon, T
    Ouisse, T
    Grisolia, J
    Ben-Assayag, G
    Jaussaud, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 61-2 : 368 - 372
  • [3] Nitrogen implantation in 4H and 6H-SiC
    LETI-CEA, Département de Micro-technologies, CEA-Grenoble, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
    不详
    不详
    不详
    Mater Sci Eng B Solid State Adv Technol, (368-372):
  • [4] Spectroscopic investigation of vanadium acceptor level in 4H and 6H-SiC
    Lauer, V
    Brémond, G
    Souifi, A
    Guillot, G
    Chourou, K
    Madar, R
    Clerjaud, B
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 635 - 638
  • [5] Vanadium donor and acceptor levels in semi-insulating 4H - And 6H-SiC
    Mitchel, W.C.
    Mitchell, W.D.
    Landis, G.
    Smith, H.E.
    Lee, Wonwoo
    Zvanut, M.E.
    Journal of Applied Physics, 2007, 101 (01):
  • [6] Experimental characterization and numerical simulation of the electrical properties of nitrogen, aluminum, and boron in 4H/6H-SiC
    Kaindl, W
    Lades, M
    Kaminski, N
    Niemann, E
    Wachutka, G
    JOURNAL OF ELECTRONIC MATERIALS, 1999, 28 (03) : 154 - 160
  • [7] Experimental characterization and numerical simulation of the electrical properties of nitrogen, aluminum, and boron in 4H/6H-SiC
    W. Kaindl
    M. Lades
    N. Kaminski
    E. Niemann
    G. Wachutka
    Journal of Electronic Materials, 1999, 28 : 154 - 160
  • [8] Optical characterization of excess carrier lifetime and surface recombination in 4H/6H-SiC
    Galeckas, A
    Linnros, J
    Frischholz, M
    Grivickas, V
    APPLIED PHYSICS LETTERS, 2001, 79 (03) : 365 - 367
  • [9] Thermoluminescence and related electronic processes of 4H/6H-SiC
    Stiasny, T
    Helbig, R
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 162 (01): : 239 - 249
  • [10] The acceptor level for vanadium in 4H and 6H SiC
    Zvanut, ME
    Lee, W
    Mitchel, WC
    Mitchell, WD
    Landis, G
    PHYSICA B-CONDENSED MATTER, 2006, 376 : 346 - 349