An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications

被引：56
作者：
Groenen, R
Linden, JL
van Lierop, HRM
Schram, DC
Kuypers, AD
van de Sanden, MCM
机构：
[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands
[2] TNO, TPD, Div Mat Res & Technol, NL-5600 AN Eindhoven, Netherlands
来源：
APPLIED SURFACE SCIENCE | 2001年 / 173卷 / 1-2期
关键词：
zinc oxide; expanding thermal plasma; surface texture; transparent conducting oxide; solar cells;
D O I：
10.1016/S0169-4332(00)00875-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded are. Films are deposited at 200 degreesC at the rate of 0.65-0.75 nm s(-1) exhibiting low resistivity (<10(-3) <Omega> cm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties. (C) 2001 Elsevier Science B.V. All rights reserved.
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页码：40 / 43
页数：4
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