Top-coats for scalable Nano-manufacturing with High-χ Block Copolymers in Lithographic Applications

被引：0

作者：

Chevalier, Xavier ^{[1
]}

Correia, Cindy Gomez ^{[2
]}

Pound-Lana, Gwenaelle ^{[3
]}

Bezard, Philippe ^{[3
,4
]}

Serege, Matthieu ^{[3
]}

Petit-Etienne, Camille ^{[3
]}

Gay, Guillaume ^{[3
]}

Cunge, Gilles ^{[3
]}

Cabannes-Boue, Benjamin ^{[2
]}

Nicolet, Celia ^{[1
]}

Navarro, Christophe ^{[1
]}

Cayrefourcq, Ian ^{[1
,5
]}

Mueller, Marcus ^{[6
]}

Hadziioannou, Georges ^{[2
]}

Iliopoulos, Ilias ^{[7
]}

Fleury, Guillaume ^{[2
]}

Zelsmann, Marc ^{[3
]}

机构：

[1] GRL, ARKEMA FRANCE, Route Natl 117,BP34, F-64170 Lacq, France

[2] Univ Bordeaux, CNRS, Bordeaux INP, LCPO,UMR 5629, F-33600 Pessac, France

[3] Univ Grenoble Alpes, CNRS, CEA LETI Minatec, Grenoble INP,LTM, F-38000 Grenoble, France

[4] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

[5] I TEN SA, 12 Chemin Jubin, F-69570 Dardilly, France

[6] Georg August Univ Gottingen, Inst Theoret Phys, D-37077 Gottingen, Germany

[7] HESAM Univ, Arts & Metiers Inst Technol, CNRS, Lab PIMM,Cnam, 151 Blvd Hop, F-75013 Paris, France

来源：

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVIII | 2021年 / 11612卷

关键词：

D O I：

10.1117/12.2583717

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Results for the self-assembly of lamellar silicon-containing high-chi block copolymers (BCP) with innovative neutral top-coat design are presented. We demonstrate that these materials and associated processes are compatible with a standard lithographic process, and oriented toward a potential high volume manufacturing. We show that this dedicated technology is able to guarantee the stability and planarity of the stack even at elevated self-assembly bake temperatures, and opens new opportunity in the fields of 3D BCPs stacks. Finally, we show interesting results for the etch-transfer of a lamellar BCP in silicon.

引用

页数：8

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