Phonon-induced linewidth of quantum-well states in monolayer Pb on Si(111)

被引:0
作者
Sklyadneva, I. Yu. [1 ,2 ,3 ,4 ]
Heid, R. [2 ]
Bohnen, K. -P. [2 ]
Chulkov, E. V. [1 ,4 ,5 ,6 ,7 ,8 ]
机构
[1] DIPC, San Sebastian 20018, Basque Country, Spain
[2] Karlsruher Inst Technol, Inst Festkorperphys, D-76021 Karlsruhe, Germany
[3] RAS, Inst Strength Phys & Mat Sci SB, Tomsk 634021, Russia
[4] Tomsk State Univ, Tomsk 634050, Russia
[5] Univ Basque Country, CSIC, Fac Ciencias Quim, Dept Fis Mat, Apdo 1072, San Sebastian 20080, Basque Country, Spain
[6] Univ Basque Country, CSIC, Fac Ciencias Quim, Ctr Mixto, Apdo 1072, San Sebastian 20080, Basque Country, Spain
[7] Univ Basque Country, CSIC, MPC, CFM,Ctr Mixto, San Sebastian 20018, Spain
[8] St Petersburg State Univ, St Petersburg 199034, Russia
关键词
Lead overlayer on Si(111); Quantum-well states; Lifetime; Electron-phonon coupling; ELECTRONIC EXCITATIONS; METAL-FILMS; DYNAMICS;
D O I
10.1016/j.susc.2018.01.012
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report a study of the electron-phonon contribution to the linewidth of quantum-well states in a surface superstructure formed by a 4/3-monolayer of Pb on Si(111), a dense phase with a root 3 x root 3 unit cell. Ab initio calculations based on the density-functional theory were carried out using a linear response approach in the mixed-basis pseudopotential representation. The phonon-induced contribution to the lifetime broadening is analyzed for both excited electrons and holes. The phonon contribution is found to be generally very sensitive to the energy position of the excited electron (hole) except for unoccupied Pb electronic states inside the Si band gap where the phonon-induced linewidth varies smoothly around similar to 13 meV irrespective of electron energy. This differs for occupied Pb electronic states, which exhibit larger linewidths, or shorter lifetimes, because numerous phonon-mediated transitions to Si electronic bands substantially increase the electron-phonon coupling. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:86 / 90
页数:5
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