Luminescence related to high density of Mg-induced stacking faults in homoepitaxially grown GaN

被引:31
作者
Khromov, S. [1 ]
Hemmingsson, C. G. [1 ]
Amano, H. [2 ]
Monemar, B. [1 ]
Hultman, L. [1 ]
Pozina, G. [1 ]
机构
[1] Linkoping Univ, Dept Phys Chem & Biol IFM, S-58183 Linkoping, Sweden
[2] Nagoya Univ, Dept Elect Engn & Comp Sci, Chikusa Ku, Nagoya, Aichi 4648603, Japan
来源
PHYSICAL REVIEW B | 2011年 / 84卷 / 07期
基金
瑞典研究理事会;
关键词
BULK GAN; ELECTRONIC-STRUCTURE; DOPED GAN;
D O I
10.1103/PhysRevB.84.075324
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of Mg doping on stacking fault (SF) formation in c-plane GaN grown by metal-organic chemical-vapor deposition has been studied for Mg concentration between 2 x 10(18) cm(-3) and 5 x 10(19) cm(-3). Transmission electron microscopy studies demonstrate a direct correlation between the increasing Mg content and the number of small (3-10-nm long) SFs present. The energy dispersive x-ray analysis (EDX) line profile of a SF shows that the Mg-impurity atom resides at a distance approximately 5 nm from the SF. Cathodoluminescence (CL) mapping reveals that the Mg-doped regions radiate at energies corresponding to known SF emission peaks. SF-related peaks in CL spectra show metastability, which may be attributed to transfer processes involving Mg acceptors and nearby associated SFs.
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页数:6
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