Magnetoelastic characterization of thin films dedicated to magnetomechanical microsensor applications

被引:21
作者
Chiriac, H
Pletea, M
Hristoforou, E
机构
[1] Natl Inst Res & Dev Tech Phys, Iasi 6600 3, Romania
[2] TEI Chalkis, Metrol Lab, Psahna 34400, Euboea, Greece
关键词
magnetomechanical microsensors; magnetoelastic media; magnetoelastic coefficients; magnetostrictive amorphous thin films;
D O I
10.1016/S0924-4247(98)00033-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper discusses the results of measurements on the saturation magnetostriction constant lambda(6), magnetoelastic coupling coefficient b(y,2) and magnetostriction strain coefficient d for Ni-evaporated and Fe70B20Si6C4-sputtered thin films on silicon and mica substrates. These results are presented in correlation with other magnetic properties (i.e., saturation magnetization, Curie temperature and anisotropy field) which characterize magnetoelastic sensing applications. We have demonstrated that the relevant properties of the magnetoelastic media used for magnetomechanical microsensors can be considerably improved by using amorphous Fe-metalloid thin films sputtered onto a silicon substrate in comparison with conventional magnetostrictive thin films evaporated onto silicon and mica substrates. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
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页码:414 / 418
页数:5
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