Determination of a Safe Distance for Atomic Hydrogen Depositions in Hot-Wire Chemical Vapour Deposition by Means of CFD Heat Transfer Simulations

被引：6

作者：

Fourie, Lionel Fabian ^{[1
]}

Square, Lynndle ^{[2
]}

机构：

[1] Univ Western Cape, Dept Phys & Astron, ZA-7535 Bellville, South Africa

[2] North West Univ, Dept Phys, ZA-2520 Potchefstroom, South Africa

来源：

FDMP-FLUID DYNAMICS & MATERIALS PROCESSING | 2020年 / 16卷 / 02期

基金：

新加坡国家研究基金会;

关键词：

Heat transfer; HWCVD; OpenFOAM; atomic hydrogen; CVD; TEMPERATURE;

D O I：

10.32604/fdmp.2020.08771

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A heat transfer study was conducted, in the framework of Computational Fluid Dynamics (CFD), on a Hot-Wire Chemical Vapour Deposition (HWCVD) reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD. The objective of this study was to show the feasibility of using heat transfer simulations in determining a safe deposition distance for deposition of this kind. All CFD simulations were set-up and solved within the framework of the CFD packages of OpenFOAM namely; snappyHexMesh for mesh generation, buoyantSimpleFoam and rhoSimpleFoam as the solvers and paraView as the post-processing tool. Using a standard set of deposition parameters for the production of atomic hydrogen by HWCVD, plots of the gas temperature in the deposition region were produced. From these plots, we were able to determine a safe deposition distance in the HWCVD reactor to be in the range between 3 and 4 cm from the filament.

引用

页码：225 / 235

页数：11

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