Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings

被引：32

作者：

Mikulík, P

Jergel, M

Baumbach, T

Majková, E

Pincík, E

Luby, S

Ortega, L

Tucoulou, R

Hudek, P

Kostic, I

机构：

[1] Masaryk Univ, Lab Thin Films & Nanostruct, CZ-61137 Brno, Czech Republic

[2] Slovak Acad Sci, Inst Phys, Bratislava 84228, Slovakia

[3] EADQ, Fraunhofer Inst Zerstorungsfreie Prufverfahren, D-01326 Dresden, Germany

[4] CNRS, Cristallog Lab, F-38042 Grenoble 9, France

[5] Slovak Acad Sci, Inst Comp Syst, Bratislava 84237, Slovakia

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2001年 / 34卷 / 10A期

关键词：

D O I：

10.1088/0022-3727/34/10A/339

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Structural characterization of a fully etched amorphous W/Si multilayer grating with a lateral periodicity of 800 nm is performed by x-ray reflectivity in the coplanar and non-coplanar modes using a scintillation detector and a two-dimensional gas-filled detector, respectively. Three-dimensional reciprocal space constructions were used to explain the scattering features recorded in both geometries. Coplanar coherent grating truncation rods were fitted by a dynamical theory for rough gratings. Comparison of the reflectivity from the reference planar multilayer completes the study.

引用

页码：A188 / A192

页数：5

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