Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings

被引：32
|
作者：
Mikulík, P
Jergel, M
Baumbach, T
Majková, E
Pincík, E
Luby, S
Ortega, L
Tucoulou, R
Hudek, P
Kostic, I
机构：
[1] Masaryk Univ, Lab Thin Films & Nanostruct, CZ-61137 Brno, Czech Republic
[2] Slovak Acad Sci, Inst Phys, Bratislava 84228, Slovakia
[3] EADQ, Fraunhofer Inst Zerstorungsfreie Prufverfahren, D-01326 Dresden, Germany
[4] CNRS, Cristallog Lab, F-38042 Grenoble 9, France
[5] Slovak Acad Sci, Inst Comp Syst, Bratislava 84237, Slovakia
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2001年 / 34卷 / 10A期
关键词：
D O I：
10.1088/0022-3727/34/10A/339
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Structural characterization of a fully etched amorphous W/Si multilayer grating with a lateral periodicity of 800 nm is performed by x-ray reflectivity in the coplanar and non-coplanar modes using a scintillation detector and a two-dimensional gas-filled detector, respectively. Three-dimensional reciprocal space constructions were used to explain the scattering features recorded in both geometries. Coplanar coherent grating truncation rods were fitted by a dynamical theory for rough gratings. Comparison of the reflectivity from the reference planar multilayer completes the study.
引用
收藏
页码：A188 / A192
页数：5
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