Investigation of the electrical activity of partial dislocations in SiC p-i-n diodes -: art. no. 033503

被引:26
作者
Maximenko, SI [1 ]
Pirouz, P
Sudarshan, TS
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
[2] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA
关键词
D O I
10.1063/1.1999297
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electron-beam-induced current (EBIC) mode of scanning electron microscopy was employed to investigate the nucleation and development of stacking faults (SFs) during forward high current stress operation of 4H-SiC p-i-n diodes. The EBIC technique is shown to be a valuable tool for the visualization and analysis of mobile and immobile partial dislocations bounding the SFs and their recombination activity. Both Si and C core partial dislocations exhibit similar EBIC contrast. It is shown that threading edge dislocations can be one source of SF generation leading to the degradation of p-i-n diodes. (c) 2005 American Institute of Physics.
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页数:3
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