Growth and shape transition of small silicon self-interstitial clusters

被引:28
作者
Lee, Sangheon [1 ]
Hwang, Gyeong S. [1 ]
机构
[1] Univ Texas Austin, Dept Chem Engn, Austin, TX 78712 USA
来源
PHYSICAL REVIEW B | 2008年 / 78卷 / 04期
关键词
D O I
10.1103/PhysRevB.78.045204
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The growth behavior of small self-interstitial clusters in crystalline Si is presented based on extensive combined Metropolis Monte Carlo, tight-binding molecular dynamics, and density-functional theory calculations. New stable structures for small interstitial clusters (I-n,5 <= n <= 16) are determined, showing that the compact geometry appears favored when the cluster size is smaller than 10 atoms (n < 10). The fourfold-coordinated dodecainterstitial (I-12) structure with C-2h symmetry is identified to serve as an effective nucleation center for larger extended defects. This work provides the first theoretical support for earlier experiments which suggest a shape transition from compact to elongated structures around n=10.
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页数:7
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