High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization

被引:115
作者
Ehiasarian, A. P. [1 ]
Hecimovic, A. [2 ]
de los Arcos, T. [2 ]
New, R. [1 ]
Schulz-von der Gathen, V. [2 ]
Boeke, M. [2 ]
Winter, J. [2 ]
机构
[1] Sheffield Hallam Univ, HIPIMS Technol Ctr, Sheffield S1 1WB, S Yorkshire, England
[2] Ruhr Univ Bochum, Inst Expt Phys 2, Bochum, Germany
关键词
OSCILLATIONS;
D O I
10.1063/1.3692172
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on instabilities in high power impulse magnetron sputtering plasmas which are likely to be of the generalized drift wave type. They are characterized by well defined regions of high and low plasma emissivity along the racetrack of the magnetron and cause periodic shifts in floating potential. The azimuthal mode number in depends on plasma current, plasma density, and gas pressure. The structures rotate in (E) over right arrow x (B) over right arrow direction at velocities of similar to 10 km s(-1) frequencies up to 200 kHz. Collisions with residual gas atoms slow down the rotating wave, whereas increasing ionization degree of the gas and plasma conductivity speeds it up. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3692172]
引用
收藏
页数:4
相关论文
共 17 条
[1]  
[Anonymous], 2010, PLASMA PHYS INTRO LA
[2]   Bifurcations of current transfer through a collisional sheath with ionization and self-organization on glow cathodes [J].
Benilov, M. S. .
PHYSICAL REVIEW E, 2008, 77 (03)
[3]   Investigation of oscillations and anomalous transport in a hydrogen hollow cathode discharge by a spatially three-dimensional two-fluid model [J].
Biel, W ;
Kempkens, H ;
Uhlenbusch, J .
PLASMA PHYSICS AND CONTROLLED FUSION, 1998, 40 (11) :1845-1867
[4]   Measurement of the magnetic field change in a pulsed high current magnetron discharge [J].
Bohlmark, J ;
Helmersson, U ;
VanZeeland, M ;
Axnäs, I ;
Alami, J ;
Brenning, N .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (04) :654-661
[5]   A bulk plasma model for dc and HiPIMS magnetrons [J].
Brenning, N. ;
Axnas, I. ;
Raadu, M. A. ;
Lundin, D. ;
Helmerson, U. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2008, 17 (04)
[6]  
Chen F. F., 1984, INTRO PLASMA PHYS, P199
[7]   Plasma oscillations in Hall thrusters [J].
Choueiri, EY .
PHYSICS OF PLASMAS, 2001, 8 (04) :1411-1426
[8]   Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion [J].
Ehiasarian, A. P. ;
Wen, J. G. ;
Petrov, I. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (05)
[9]   Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films [J].
Ehiasarian, A. P. ;
Vetushka, A. ;
Gonzalvo, Y. Aranda ;
Safran, G. ;
Szekely, L. ;
Barna, P. B. .
JOURNAL OF APPLIED PHYSICS, 2011, 109 (10)
[10]   Ion composition produced by high power impulse magnetron sputtering discharges near the substrate [J].
Ehiasarian, A. P. ;
Vetushka, A. ;
Hecimovic, A. ;
Konstantinidis, S. .
JOURNAL OF APPLIED PHYSICS, 2008, 104 (08)