Pulsed laser deposition of lithium niobate: a parametric study

被引：19
作者：
Ghica, D
Ghica, C
Gartner, M
Nelea, V
Martin, C
Cavaleru, A
Mihailescu, IN
机构：
[1] Natl Inst Optoelect, Bucharest 76900, Romania
[2] IPCMS, GSI, F-67037 Strasbourg, France
[3] Romanian Acad, Inst Phys Chem, Bucharest 77208, Romania
[4] ENSAIS, F-67084 Strasbourg, France
[5] Natl Inst Laser Plasma & Radiat Phys, Bucharest 76900, Romania
来源：
APPLIED SURFACE SCIENCE | 1999年 / 138卷
关键词：
pulsed laser deposition; LiNbO(3) thin films;
D O I：
10.1016/S0169-4332(98)00463-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We report the deposition of high optical quality LiNbO(3) thin films on Si(lll) substrates by pulsed laser ablation using a KrF* excimer laser (lambda = 248 nm, tau = 20 ns) source. Experiments have been conducted in oxygen at 5-20 Pa. Si(lll) collectors were uniformly heated at 500-700 degrees C. Some of the as-deposited collectors were submitted to an in-situ thermal treatment in oxygen (10(3)-10(4) Pa) at the same temperature. The deposited thin films were characterised by grazing incidence X-ray diffraction (GIXRD), transmission electron microscopy (TEM) and spectroscopic ellipsometry (SE). Our LiNbO(3) thin films, achieved at relatively low temperature (550 degrees C), are the first textured and high optical quality pulsed laser deposited films on Si. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：617 / 621
页数：5
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