Nanostructured magnesium fluoride antireflective films with ultra-high laser induced damage thresholds

被引：10

作者：

Chi, Fangting ^{[1
]}

Zhang, Qian ^{[1
]}

Zhang, Lingjie ^{[1
]}

Wei, Guilin ^{[1
]}

Wang, Lielin ^{[1
]}

Yi, Facheng ^{[1
]}

机构：

[1] Southwest Univ Sci & Technol, Fundamental Sci Nucl Wastes & Environm Safety Lab, Mianyang 621010, Peoples R China

来源：

MATERIALS LETTERS | 2015年 / 150卷

基金：

中国国家自然科学基金;

关键词：

Magnesium fluoride; Antireflective films; Laser induced damage thresholds; Nanoparticles; Optical materials and properties; SILICA; RESISTANCE; NM;

D O I：

10.1016/j.matlet.2015.02.136

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanostructured magnesium fluoride (MgF2) antireflective films with ultra-high laser induced damage thresholds (LIDTs) have been prepared through dip coating of similar to 10 nm MgF2 nanoparticles on fused silica substrates. The films increase transmittance from 93.0% for bare substrates to 99.98% for coated substrates. The LIDTs of the nanostructured MgF2 films reach as high as 25 J/cm(2) at 351 nm, 34 J/cm(2) at 527 nm and 63 J/cm(2) at 1053 nm, respectively. The LIDTs of the nanostructured MgF2 films is higher than that of dense MgF2 films and sol-gel derived silica films. Such high LIDTs of the nanostructured MgF2 films may be attributed to the large band gap and the quantum size effect of the MgF2 nanoparticles. These nanostructured MgF2 films will be utilized as antireflective films used in high-peak-power laser system. (C) 2015 Published by Elsevier B.V.

引用

页码：28 / 30

页数：3

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