Influence of Oxygen content on the electrochemical behavior of Ta1-xOx coatings

被引:13
作者
Almeida Alves, C. F. [1 ]
Calderon, S. V. [1 ,2 ]
Dias, D. [1 ]
Carvalho, S. [1 ,2 ]
机构
[1] Univ Minho, GRF CFUM, Dept Phys, Campus Azurem, P-4800058 Guimaraes, Portugal
[2] Univ Coimbra, SEG CEMUC, Dept Mech Engn, P-3030788 Coimbra, Portugal
关键词
Ta1-xOx coatings; dental implants; corrosion performance; EIS; SPUTTERED ALPHA-TA; CORROSION BEHAVIOR; IMPLANT APPLICATIONS; POROUS TANTALUM; PHOSPHATE IONS; IN-VITRO; TITANIUM; FILMS; SURFACE; STEEL;
D O I
10.1016/j.electacta.2016.05.188
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this study, Ta1-xOx coatings were deposited by reactive magnetron sputtering aiming at the enhancement of the electrochemical stability stainless steel 316L. The coatings were produced using variable oxygen content in order to determine its influence on the films morphological features and corrosion resistance. Structural and morphological characteristics were correlated with the corrosion behavior in artificial saliva. Potentiodynamic and electrochemical impedance spectroscopy tests were complemented with X-ray photoelectron spectroscopy to determine the electrochemical behavior of the coatings. The results reveal a more protective behavior of the coatings as the oxygen amount increases in the films, as well as pitting inhibition in the coated stainless steel, independently of the film composition. A synergetic effect between Ta2O5 and phosphate-based passive layers is suggested as the protective mechanisms of the coatings; while the more active electrochemical behavior of low oxygen content films is evidenced as a consequence of the metallic tantalum on the surface with a more open morphology and larger density of defects on the surface. (C) 2016 Published by Elsevier Ltd.
引用
收藏
页码:385 / 394
页数:10
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