Electrical sensing of DNA hybridization in porous silicon layers

被引:30
作者
Archer, M
Fauchet, PM
机构
[1] Univ Rochester, Ctr Future Hlth, Rochester, NY 14627 USA
[2] Univ Rochester, Dept Biomed Engn, Rochester, NY USA
[3] Univ Rochester, Dept Elect & Comp Engn, Rochester, NY USA
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 2003年 / 198卷 / 02期
关键词
D O I
10.1002/pssa.200306641
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The objective of this work is to use porous silicon (PSi) layers as substrate material to transduce hybridization of DNA into a change in conductance. A coplanar configuration of the contact electrodes allows a complete exposure of the porous silicon layer to the sensing species without the need of top contacts or electrolyte solutions. Synthetic oligonucleotides were infiltrated into the porous silicon layers to sense the hybridization event. Hybridization of a single base sequence to its complementary strand was used as a model to demonstrate the response of the layer to the binding of complex sequences. We hypothesize that the observed response involves the activity of surface states present at the silicon-silicon dioxide (Si-SiO2) interface and sensitive to the change in charge at the surface of the layer.
引用
收藏
页码:503 / 507
页数:5
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