Characterization and Comparison of Planar and Trench Silicon Carbide (SiC) Power MOSFETs

被引:2
作者
Wang, Zhiqiang [1 ]
Chinthavali, Madhu [1 ]
Campbell, Steven [1 ]
机构
[1] Oak Ridge Natl Lab, Power Elect & Elect Machinery Grp, Oak Ridge, TN 37831 USA
来源
GALLIUM NITRIDE AND SILICON CARBIDE POWER TECHNOLOGIES 6 | 2016年 / 75卷 / 12期
关键词
D O I
10.1149/07512.0145ecst
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a comprehensive evaluation and experimental comparison of silicon carbide power MOSFETs through double pulse test. First, a universal hardware platform is designed and developed to test power semiconductor devices with various device packages and measuring requirements. Using the developed platform, the static characteristics and switching performance of the two types of SiC MOSFETs (one planar and one trench type) are evaluated under different case temperatures from 25 degrees C to 175 degrees C. Based on the evaluation data, a comparison of both SiC MOSFETs is conducted in terms of their on-state resistance, switching loss, and temperature dependent behavior. It is found that the latest trench SiC MOSFETs present similar switching loss while much lower conduction loss compared to existing commercial planar SiC MOSFETs. Moreover, the trench devices show a nearly temperature independent switching loss, which is beneficial to suppress the potential thermal runaway issue under high temperature continuous operation.
引用
收藏
页码:145 / 152
页数:8
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