Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2

被引:27
作者
Felix, Nelson M. [1 ]
De Silva, Anuja
Luk, Camille Man Yin
Ober, Christopher K.
机构
[1] Cornell Univ, Sch Chem & Biomol Engn, Ithaca, NY 14853 USA
[2] Cornell Univ, Dept Chem & Chem Biol, Ithaca, NY 14853 USA
[3] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1039/b709649f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The dissolution characteristics of small molecule photoresist films in supercritical CO2 are measured using laser interferometry. These small molecule photoresists, referred to as molecular glasses, have shown impressive CO2 solubility in recent reports, and in order to understand this behavior the structure-property relationships that control thin-film dissolution of phenolic molecular glasses are explored. Fully tert-butoxycarbonyl-protected versions of these molecular glasses are tested, and they show relatively fast (> 500 nm min(-1)) dissolution rates that depend primarily on molecular weight and not on the number of carbonyl groups. Material glass transition temperature also plays a role, as those films that are not sufficiently plasticized by the supercritical CO2 have much slower dissolution rates than films of comparable molecular size and type. Small molecules containing up to two unprotected polar hydroxyl groups still show significant dissolution rates in supercritical CO2.
引用
收藏
页码:4598 / 4604
页数:7
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