Design of SOI CMOS operational amplifiers for applications up to 300 degrees C

被引:60
作者
Eggermont, JP
DeCeuster, D
Flandre, D
Gentinne, B
Jespers, PGA
Colinge, JP
机构
[1] Microelectronics Laboratory, Univ. Catholique de Louvain
[2] Univ. Catholique de Louvain, Louvain-la-Neuve
[3] NTT Headquarters, Tokyo
[4] Ctro. Nac. de Microelectronica, Barcelona
[5] Lab. de Microélectronique, Louvain-la-Neuve
[6] Ecole Royale Militaire, Brussels
[7] Ctr. Natl. d'Etud. des Telecom., Meylan
[8] Hewlett-Packard Laboratories, Palo Alto, CA
[9] Interuniv. Microelektronica Centrum, Leuven
关键词
D O I
10.1109/4.487994
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Design guidelines using two analog parameters (Early voltage and transconductance to drain current ratio) are proposed for correct operation of silicon-on-insulator (SOI) CMOS operational amplifiers (opamp) at elevated temperature up to 300 degrees, The dependence of these parameters on temperature is first described, A new single-stage CMOS opamp model using only these two parameters is presented and compared to measurements of several implementations operating up to 300 degrees C for applications such as micropower (below 4 mu W at 1.2 V supply voltage), high gain (65 dB) or high frequency up to 100 MHz, Trade-offs among such factors as gain, bandwidth, phase margin, signal swing, noise, matching, slew rate and power consumption are described, The extension to other architectures is suggested and the design methodology is valid for bulk as well as SOI CMOS opamps.
引用
收藏
页码:179 / 186
页数:8
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