Thermal impact of extreme die thinning in bump-bonded three-dimensional integrated circuits

被引:1
|
作者
Melamed, Samson [1 ]
Watanabe, Naoya [1 ]
Nemoto, Shunsuke [1 ]
Shimamoto, Haruo [1 ]
Kikuchi, Katsuya [1 ]
Aoyagi, Masahiro [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Cent 1,1-1-1 Umezono, Tsukuba, Ibaraki 3058560, Japan
基金
日本学术振兴会;
关键词
3DIC; Die thinning; Thermal resistance; Integrated circuit;
D O I
10.1016/j.microrel.2017.05.030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In three-dimensional integrated circuits (3DICs) aggressive wafer-thinning can lead to large thermal gradients, including spikes in individual device temperatures. In a non-thinned circuit, the large bulk silicon wafer on which devices are built.works as a very good thermal conductor, enabling heat to diffuse laterally. In this paper we use measurement and simulation results to examine the normalized temperature rise of an on-chip heater in a two-tier bump-bonded 3D stacked system. We begin by experimentally validating our simulation model and then use it to formulate best and worst case scenarios for the temperature rise in such a system. Die thinning is seen to have a pronounced effect on the thermal response, which can adversely affect system reliability. Thinning the top tier from 725 pm to 10 pm resulted in approximately an 8 times increase in the normalized temperature rise of the heater in our test chip for the worst case scenario and just over a 6 times increase for the best case scenario. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:380 / 386
页数:7
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