Anisotropy of thermal expansion in YAlO3 and NdGaO3 -: art. no. 251911

被引:28
作者
Chaix-Pluchery, O [1 ]
Chenevier, B [1 ]
Robles, JJ [1 ]
机构
[1] Ecole Natl Super Phys Grenoble, INPG, CNRS, UMR 5628,Lab Mat & Genie Phys, F-38402 St Martin Dheres, France
关键词
D O I
10.1063/1.1944901
中图分类号
O59 [应用物理学];
学科分类号
摘要
YAlO3 and NdGaO3 thermal expansion coefficients were measured using in situ powder x-ray diffraction in the temperature range of 28-650 degrees C. They exhibit a clear anisotropy: The expansion, quite similar along the [100] and [001] directions, is much lower along the [010] direction. The formation of cracks observed in YBa2Cu3O7-delta thin films deposited on YAlO3 and NdGaO3 substrates is likely related to the anisotropy. Stress value calculations have been performed in both systems. They indicate that the intrinsic components are specifically high in YAlO3. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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