Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

被引：14

作者：

Murakami, K ^{[1
]}

Saito, J ^{[1
]}

Ota, K ^{[1
]}

Kondo, H ^{[1
]}

Ishii, M ^{[1
]}

Kawakami, J ^{[1
]}

Oshino, T ^{[1
]}

Sugisaki, K ^{[1
]}

Zhu, YC ^{[1
]}

Hasegawa, M ^{[1
]}

Sekine, Y ^{[1
]}

Takeuchi, S ^{[1
]}

Ouchi, C ^{[1
]}

Kakuchi, O ^{[1
]}

Watanabe, Y ^{[1
]}

Hasegawa, T ^{[1
]}

Hara, S ^{[1
]}

Suzuki, A ^{[1
]}

机构：

[1] Assoc Super Adv Elect Technol, Sagamihara Lab, ASET, EUV Metrol Techol Res Dept, Sagamihara, Kanagawa 2280828, Japan

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2 | 2003年 / 5037卷

关键词：

wavefront metrology; ELJV interferometer; PDI; shearing interferometer; undulator;

D O I：

10.1117/12.484935

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator light source was designed and constructed for the purpose of developing wavefront measurement technology with the exposure wavelength of the projection optics of EUV lithography systems. EEI has the capability of performing five different EUV wavefront metrology methods.

引用

页码：257 / 264

页数：8

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