A multi-layer electro-optic field probe

被引:4
|
作者
Lee, Dong-Joon [1 ]
Kwon, Jae-Yong [1 ]
Ryu, Han-Young [1 ]
Whitaker, John F. [2 ]
机构
[1] Korea Res Inst Stand & Sci, Div Phys Metrol, Taejon 305340, South Korea
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA
来源
OPTICS EXPRESS | 2010年 / 18卷 / 24期
关键词
MICROWAVE;
D O I
10.1364/OE.18.024735
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a novel design method and sensing scheme for an electro-optic field probe using multi-stratified layers of electro-optic wafers. A serial stack of cascaded layers is found to be capable of enhancing the performance of interferometric electro-optic light modulation that utilizes the slopes of interference fringe patterns and field-induced electro-optic phase retardations within wafers. The absolute sensitivity of the probe is also characterized with a micro-TEM cell that generates electric fields distributions with accurate, calculable strength for use in probe calibration. The sensitivity of a multi-layered probe-per unit electro-optic wafer volume - was enhanced by 6 dB compared to that of a single-layer one. (C) 2010 Optical Society of America
引用
收藏
页码:24735 / 24744
页数:10
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