Nanolithography based on real-time electrically controlled indentation with an atomic force microscope for nanocontact elaboration

被引：50

作者：

Bouzehouane, K ^{[1
]}

Fusil, S

Bibes, M

Carrey, J

Blon, T

Le Dû, M

Seneor, P

Cros, V

Vila, L

机构：

[1] CNRS, Unite Mixte Phys, F-91404 Orsay, France

[2] Univ Evry, F-91025 Evry, France

[3] Univ Louvain, Lab PCPM, B-1348 Louvain, Belgium

来源：

NANO LETTERS | 2003年 / 3卷 / 11期

关键词：

D O I：

10.1021/nl034610j

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report on the fabrication of nanocontacts by indentation of an ultrathin insulating photoresist layer deposited on various types of conductive structures. A modified atomic force microscope (AFM) designed for local resistance measurements is used as a nanoindenter. The nanoindentation is performed while measuring continuously the resistance between the conductive tip of the AFM and the conductive layer, which is used as the trigger parameter to stop the indentation. This allows a very accurate control of the indentation process, The indented hole is subsequently filled by a metal to create a contact on the underlying layer. We show that nanocontacts; in the range of 1 to 10 nm(2) can be created with this technique.

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页码：1599 / 1602

页数：4

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