Homogeneous nano-patterning using plasmon-assisted photolithography

被引：29
作者：
Ueno, Kosei [1 ,2 ]
Takabatake, Satoaki [1 ]
Onishi, Ko [1 ]
Itoh, Hiroko [1 ]
Nishijima, Yoshiaki [1 ]
Misawa, Hiroaki [2 ]
机构：
[1] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0010021, Japan
[2] Japan Sci & Technol Agcy, PRESTO, Kawaguchi, Saitama 3320012, Japan
来源：
APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 01期
关键词：
D O I：
10.1063/1.3606505
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3606505]
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页数：3
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