Progress in reducing ICRF-specific impurity release in ASDEX upgrade and JET

被引：16

作者：

Bobkov, V. ^{[1
,76
]}

Aguiam, D. ^{[2
]}

Baruzzo, M. ^{[3
,26
]}

Borodin, D. ^{[4
,53
]}

Borodkina, I. ^{[4
,5
,53
]}

Brezinsek, S. ^{[4
,53
]}

Coffey, I. ^{[6
,43
]}

Colas, L. ^{[7
,22
]}

Czarnecka, A. ^{[8
,63
]}

Delabie, E. ^{[9
,87
]}

Dumortier, P. ^{[10
,72
]}

Durodie, F. ^{[10
,72
]}

Dux, R. ^{[1
,15
]}

Faugel, H. ^{[1
]}

Fuenfgelder, H. ^{[1
]}

Giroud, C. ^{[6
,21
]}

Goniche, M. ^{[7
,22
]}

Hobirk, J. ^{[1
,76
]}

Herrmann, A. ^{[1
]}

Jacquot, J. ^{[1
]}

Jacquet, Ph. ^{[6
]}

Kallenbach, A. ^{[1
,76
]}

Krivska, A. ^{[10
,72
]}

Klepper, C. C. ^{[9
]}

Lerche, E. ^{[10
,72
]}

Menmuir, S. ^{[6
,21
,56
]}

Milanesio, D. ^{[11
]}

Maggiora, R. ^{[11
]}

Monakhov, I. ^{[6
,21
]}

Nave, F. ^{[2
]}

Neu, R. ^{[1
,12
,76
]}

Noterdaeme, J. -M. ^{[1
,13
]}

Ochoukov, R. ^{[1
]}

Puetterich, Th ^{[1
]}

Reinke, M. ^{[9
,87
]}

Tuccilo, A. ^{[3
]}

Tudisco, O. ^{[3
]}

Van Eester, D. ^{[10
,72
]}

Wang, Y. ^{[14
]}

Yang, Q. ^{[14
]}

Zhang, W. ^{[1
,13
,76
]}

Abduallev, S. ^{[53
]}

Abhangi, M. ^{[60
]}

Abreu, P. ^{[67
]}

Afzal, M. ^{[21
]}

Aggarwal, K. M. ^{[43
]}

Ahlgren, T. ^{[115
]}

Ahn, J. H. ^{[22
]}

Aho-Mantila, L. ^{[125
]}

Aiba, N. ^{[83
]}

机构：

[1] Max Planck Inst Plasma Phys, Boltzmannstr 2, D-85748 Garching, Germany

[2] Univ Lisbon, Inst Super Tecn, Inst Plasmas & Fusao Nucl, P-1049001 Lisbon, Portugal

[3] ENEA, Frascati, Italy

[4] Forschungszentrum Julich, Inst Energie & Klimaforsch Plasmaphys, Partner Trilateral Euregio Cluster TEC, D-52425 Julich, Germany

[5] Natl Res Nucl Univ Mephi, Kashirskoe Sh 31, Moscow, Russia

[6] CCFE, Culham Sci Ctr, Abingdon OX14 3DB, Oxon, England

[7] CEA, IRFM, F-13108 St Paul Les Durance, France

[8] Inst Plasma Phys & Laser Microfus, Hery 23 Str, PL-01497 Warsaw, Poland

[9] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA

[10] LPP ERM KMS, TEC Partner, Brussels, Belgium

[11] Politecn Torino, Turin, Italy

[12] Tech Univ Munich, Boltzmannstr 15, D-85748 Garching, Germany

[13] Univ Ghent, Dept Appl Phys, Ghent, Belgium

[14] Chinese Acad Sci, Inst Plasma Phys, ASIPP, Hefei, Anhui, Peoples R China

[15] Aalto Univ, POB 14100, FIN-00076 Aalto, Finland

[16] Aix Marseille Univ, CNRS, Ctr Marseille, M2P2 UMR 7340, F-13451 Marseille, France

[17] Aix Marseille Univ, CNRS, IUSTI UMR 7343, F-13013 Marseille, France

[18] Aix Marseille Univ, CNRS, PIIM, UMR 7345, F-13013 Marseille, France

[19] Arizona State Univ, Tempe, AZ USA

[20] Barcelona Supercomp Ctr, Barcelona, Spain

[21] CCFE Culham Sci Ctr, Abingdon OX14 3DB, Oxon, England

[22] CEA, IRFM, F-13108 St Paul Les Durance, France

[23] Univ Calif San Diego, Ctr Energy Res, La Jolla, CA 92093 USA

[24] Ctr Brasileiro Pesquisas Fis, Rua Xavier Sigaud 160, BR-22290180 Rio De Janeiro, Brazil

[25] Consorzio CREATE, Via Claudio 21, I-80125 Naples, Italy

[26] Consorzio RFX, Corso Stati Uniti 4, I-35127 Padua, Italy

[27] Daegu Univ, Gyongsan 712174, Gyeongbuk, South Korea

[28] Univ Carlos III Madrid, Dept Fis, Madrid 28911, Spain

[29] Univ Ghent, Dept Appl Phys UG, St Pietersnieuwstr 41, B-9000 Ghent, Belgium

[30] Chalmers Univ Technol, Dept Earth & Space Sci, SE-41296 Gothenburg, Sweden

[31] Univ Cagliari, Dept Elect & Elect Engn, Piazza Armi 09123, Cagliari, Italy

[32] Comenius Univ, Dept Expt Phys, Fac Math Phys & Informat, Mlynska Dolina F2, Bratislava 84248, Slovakia

[33] Warsaw Univ Technol, Dept Mat Sci, PL-01152 Warsaw, Poland

[34] Korea Adv Inst Sci & Technol, Dept Nucl & Quantum Engn, Daejeon 34141, South Korea

[35] Univ Strathclyde, Dept Phys & Appl Phys, Glasgow G4 ONG, Lanark, Scotland

[36] Uppsala Univ, Dept Phys & Astron, SE-75120 Uppsala, Sweden

[37] Chalmers Univ Technol, Dept Phys, S-41296 Gothenburg, Sweden

[38] Imperial Coll London, Dept Phys, London SW7 2AZ, England

[39] KTH, SCI, Dept Phys, SE-10691 Stockholm, Sweden

[40] Univ Basel, Dept Phys, Basel, Switzerland

[41] Univ Oxford, Dept Phys, Oxford OX1 2JD, England

[42] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England

[43] Queens Univ, Dept Pure & Appl Phys, Belfast BT7 1NN, Antrim, North Ireland

[44] Univ Catania, Dipartimento Ingn Elettr Elettron & Informat, I-95125 Catania, Italy

[45] Univ Trento, Dipartimento Ingn Ind, Trento, Italy

[46] Dublin City Univ, Dublin, Ireland

[47] Swiss Plasma Ctr, EPFL, CH-1015 Lausanne, Switzerland

[48] EUROfus Programme Management Unit, Boltzmannstr 2, D-85748 Garching, Germany

[49] Culham Sci Ctr, EUROfus Programme Management Unit, Culham OX14 3DB, England

[50] European Commiss, B-1049 Brussels, Belgium

来源：

NUCLEAR MATERIALS AND ENERGY | 2017年 / 12卷

关键词：

ICRF; RF sheath; Three-strap; 3-strap; ASDEX Upgrade; JET; ILW; A2; antenna; ILA; Sputtering; PLASMA WALL;

D O I：

10.1016/j.nme.2016.10.026

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

Use of new 3-strap ICRF antennas with all-tungsten (W) limiters in ASDEX Upgrade results in a reduction of the W sources at the antenna limiters and of the W content in the confined plasma by at least a factor of 2 compared to the W-limiter 2-strap antennas used in the past. The reduction is observed with a broad range of plasma shapes. In multiple locations of antenna frame, the limiter W source has a minimum when RF image currents are decreased by cancellation of the RF current contributions of the central and the outer straps. In JET with ITER-like wall, ITER-like antenna produces about 20% less of main chamber radiation and of W content compared to the old A2 antennas. However the effect of the A2 antennas on W content is scattered depending on which antennas are powered. Experiments in JET with trace nitrogen (N-2) injection show that a presence of active ICRF antenna close to the midplane injection valve has little effect on the core N content, both in dipole and in -90 degrees phasing. This indicates that the effect of ICRF on impurity transport across the scape-off-layer is small in JET compared to the dominant effect on impurity sources leading to increased impurity levels during ICRF operation. (C) 2016 The Authors. Published by Elsevier Ltd.

引用

页码：1194 / 1198

页数：5

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