Formation of n-alkane layers at the Vapor/Water interface

被引:32
作者
Kwon, Oh-Sun
Jing, Huaiyu
Shin, Kwanwoo [1 ]
Wang, Xiaohui
Satija, Sushil K.
机构
[1] Sogang Univ, Dept Chem, Seoul 121742, South Korea
[2] Sogang Univ, Program Integrated Biotechnol, Seoul 121742, South Korea
[3] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
关键词
D O I
10.1021/la702084e
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We present a study on the initial wetting behaviors of two low molecular weight alkanes, heptane and octane, at the vapor/water interface using both neutron and X-ray reflectometry. Combined X-ray and neutron reflectivity studies data showed that a uniform film, which has never been reported, was formed continuously at 25 degrees C. As the adsorptive deposition continued, each adsorbed film was saturated at a specific equilibrium thickness: 48 and 36 angstrom for deuterated heptane and octane, respectively, and 21 angstrom for hydrogenated octane. The thickness of the adsorbed layer measured by neutron reflectivity is in agreement with that measured using X-ray reflectivity. Our observations of continuous and saturated adsorption behaviors are analyzed qualitatively using a kinetic adsorption model.
引用
收藏
页码:12249 / 12253
页数:5
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