Investigation of laser annealing mechanisms in thin film coatings by photothermal microscopy

被引：10

作者：

Escola, Facundo Zaldivar ^{[1
]}

Mingolo, Nelida ^{[1
]}

Martinez, Oscar E. ^{[1
,2
]}

Rocca, Jorge J. ^{[3
]}

Menoni, Carmen S. ^{[3
]}

机构：

[1] UBA, Dept Fis, Fac Ingn, Av Paseo Colon 850,C1063ACV, Buenos Aires, DF, Argentina

[2] Consejo Nacl Invest Cient & Tecn, Buenos Aires, DF, Argentina

[3] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

来源：

OPTICS EXPRESS | 2019年 / 27卷 / 04期

关键词：

DEFECTS; DAMAGE;

D O I：

10.1364/OE.27.005729

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We study the evolution of the absorptance of amorphous metal oxide thin films when exposed to intense CW laser radiation measured using a photothermal microscope. The evolution of the absorptance is characterized by a nonexponential decay. Different models that incorporate linear and nonlinear absorption, free carrier absorption, and defect diffusion are used to fit the results, with constraints imposed on the fit parameters to scale with power and intensity. The model that best fits is that two types of interband defects arc passivated independently, one by a one-photon process and the other one by a two-photon process. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

引用

页码：5729 / 5744

页数：16

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