Minimax Optimization for Recipe Management in High-Mixed Semiconductor Lithography Process

被引:19
作者
Khakifirooz, Marzieh [1 ]
Chien, Chen-Fu [2 ,3 ,4 ]
Fathi, Mahdi [5 ]
Pardalos, Panos M. [6 ]
机构
[1] Tecnol Monterrey, Dept Ind Engn, Mexico City 01389, DF, Mexico
[2] Natl Tsing Hua Univ, Dept Ind Engn & Engn Management, Hsinchu 01389, Taiwan
[3] Asia Univ, Dept Business Adm, Taichung 41354, Taiwan
[4] Minist Sci & Technol, Artificial Intelligence Intelligent Mfg Syst Res, Hsinchu 30013, Taiwan
[5] Univ North Texas, G Brint Ryan Coll Business, Dept Informat Technol & Decis Sci, Denton, TX 76203 USA
[6] Univ Florida, Ctr Appl Optimizat, Dept Ind & Syst Engn, Gainesville, FL 32601 USA
关键词
Process control; Lithography; Communication systems; Tools; Data models; Predictive models; Control systems; Communication system; game theory; high-mixed manufacturing process; minimax optimization; photolithography process; recipe management; MANUFACTURING BIG DATA; TO-RUN CONTROL; PERFORMANCE ANALYSIS; YIELD ENHANCEMENT; CONTROL-SYSTEM; DISTURBANCE; CONTROLLER; PRODUCT;
D O I
10.1109/TII.2019.2957145
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This article addresses the application of minimax optimization in the control design of complex dynamic systems of the semiconductor manufacturing. We highlight the main challenge in the control system of high-mixed wafer fabrication during the photolithography process called overlay control. In the semiconductor photolithography process, the sophisticated and high-mixed setting is generated by multiple recipe adjustments for the single scanner device. The high complexity will be moderated if there is a communication interface among the process variables. We design a communication protocol for the high-mixed photolithography process for overlay control. The proposed system is designed on the basis of the recipe management system for a distinct batches of recipes. The focal point of switching recipes performs as a communication hop, where aligning recipes together make a multihop communication system for recipe management. The proposed multihop communication system is optimized by the minimax decision rule to select the best parameter setting for each recipe and boost the overlay compensation.
引用
收藏
页码:4975 / 4985
页数:11
相关论文
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[51]   Model Quality Evaluation in Semiconductor Manufacturing Process With EWMA Run-to-Run Control [J].
Zheng, Ying ;
Ling, Dan ;
Wang, Yan-Wei ;
Jang, Shi-Shang ;
Tao, Bo .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2017, 30 (01) :8-16