Preparation of fine silicon particles from amorphous silicon monoxide by the disproportionation reaction

被引:90
作者
Mamiya, M
Takei, H
Kikuchi, M
Uyeda, C
机构
[1] Osaka Univ, Grad Sch Sci, Toyonaka, Osaka 5600043, Japan
[2] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
crystallites; nanostructures; nucleation; X-ray diffraction;
D O I
10.1016/S0022-0248(01)01202-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Fine Si particles have been prepared by the disproportionation reaction of silicon monoxide (SiO), that is: 2SiO --> Si + SiO2. Amorphous powders of SiO are heated between 900 degreesC and 1400 degreesC in a flow of Ar and the obtained specimens are analyzed by X-ray powder diffraction and high-resolution transmission electron microscopy, The treatments between 1000 degreesC and 1300 degreesC for more than 0.5 h result in origination of Si particles dispersed in amorphous oxide media. The particle size varies from 1-3 to 20-40 nm, depending on the heating temperature. Kinetic analyses of the reaction reveal that the activation energy is 1.1 eV (82.1 kJ mol(-1)). The specimens annealed above 1350 degreesC changes into a mixture of Si and cristobalite, suggesting a solid state transformation in the surrounding oxides from the amorphous to crystalline states. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:457 / 461
页数:5
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