Growth kinetics and cracking of liquid-phase-deposited anatase films

被引:36
作者
Ma, Bing [1 ]
Goh, Gregory K. L.
Ma, Jan
White, Tim J.
机构
[1] Inst Mat Res & Engn, Singapore 117602, Singapore
[2] Nanyang Technol Univ, Singapore 639798, Singapore
关键词
D O I
10.1149/1.2769828
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Anatase TiO2 films were deposited on glass slides by liquid phase deposition at temperatures of 50-200 degrees C. All films displayed preferential c-axis orientation, and morphological examinations revealed that the films underwent a transition from continuous nucleation to grain growth. Kinetic analysis by the Hancock and Sharp method revealed that film growth was controlled by a phase boundary process before transitioning to a diffusion-controlled process. This transition was responsible for the change to a more columnar film morphology. It was also observed that the films cracked during drying when the films were above the critical thickness. Nitrogen adsorption-desorption isotherms revealed that the films contained pores of 4 nm and smaller and support a capillary-stress-induced film-cracking mechanism. (c) 2007 The Electrochemical Society.
引用
收藏
页码:D557 / D561
页数:5
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