Lithography based on molecular glasses

被引：43

作者：

Tsuchiya, K

Chang, SW

Felix, NM

Ueda, M

Ober, CK

机构：

[1] Tokyo Inst Technol, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan

[2] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2005年 / 18卷 / 03期

关键词：

molecular glasses; E-beam lithography; hexa(hydroxyphenyl)benzene; line edge roughness;

D O I：

10.2494/photopolymer.18.431

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (T-g) as well as amorphous properties. A positive-tone photoresist system with hexa(t-butoxycarbonyloxyphenyl)benzene was demonstrated using E-beam lithography and 200 nm pattern size was obtained.

引用

页码：431 / 434

页数：4

共 17 条

[1] Tailoring transparency of imageable fluoropolymers at 157 nm by incorporation of hexafluoroisopropyl alcohol to photoresist backbones [J].