Twist filter for the removal of macroparticles from cathodic arc plasmas

被引：35

作者：

Anders, A ^{[1
]}

MacGill, RA ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

SURFACE & COATINGS TECHNOLOGY | 2000年 / 133卷

关键词：

cathodic arc; plasma filter; macroparticles; amorphous carbon films;

D O I：

10.1016/S0257-8972(00)00881-1

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Cathodic are plasmas are known to be contaminated with macroparticles. A variety of magnetic plasma filters have been used with various success in removing the macroparticles from the plasma. In this publication, an open-architecture, double-bent filter that is twisted ('Twist Filter(TM)) is described. A cathodic are plasma deposition system was designed around this novel, very compact and efficient filter. Its major application is the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：96 / 100

页数：5

共 16 条

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