Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

被引：5

作者：

Lee, S. Y. ^{[3
]}

Cho, I. H. ^{[3
]}

Kim, J. M. ^{[3
]}

Kang, H. C. ^{[1
,2
]}

Noh, D. Y. ^{[3
]}

机构：

[1] Chosun Univ, Dept Adv Mat Engn, Kwangju 501759, South Korea

[2] Chosun Univ, Educ Ctr Mould Technol Adv Mat & Parts BK21, Kwangju 501759, South Korea

[3] Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Kwangju 500712, South Korea

来源：

JOURNAL OF SYNCHROTRON RADIATION | 2011年 / 18卷

基金：

新加坡国家研究基金会;

关键词：

hard X-ray focusing; Fresnel zone plate; X-ray lithography; ENERGY SYNCHROTRON-RADIATION; RESOLUTION; FABRICATION; MICROSCOPY; NM; LENSES; UV;

D O I：

10.1107/S0909049510044535

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Focused hard X-ray microbeams for use in X-ray nanolithography have been investigated. A 7.5 keV X-ray beam generated at an undulator was focused to about 3 mu m using a Fresnel zone plate fabricated on silicon. The focused X-ray beam retains a high degree of collimation owing to the long focal length of the zone plate, which greatly facilitates hard X-ray nanoscale lithography. The focused X-ray microbeam was successfully utilized to fabricate patterns with features as small as 100 nm on a photoresist.

引用

页码：143 / 147

页数：5

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