Asymmetric Metal-Insulator Transition in Disordered Ferromagnetic Films

被引:6
作者
Misra, R. [1 ]
Hebard, A. F. [1 ]
Muttalib, K. A. [1 ]
Woelfle, P. [2 ,3 ]
机构
[1] Univ Florida, Dept Phys, Gainesville, FL 32611 USA
[2] Karlsruhe Inst Technol, Inst Condensed Matter Theory, D-76128 Karlsruhe, Germany
[3] Karlsruhe Inst Technol, Inst Nanotechnol, D-76128 Karlsruhe, Germany
基金
美国国家科学基金会;
关键词
2-DIMENSIONAL ELECTRON-SYSTEMS; CRITICAL-BEHAVIOR; ANDERSON TRANSITION; UNIAXIAL-STRESS; SI-P; CONDUCTIVITY; SEMICONDUCTORS; LOCALIZATION; TEMPERATURE;
D O I
10.1103/PhysRevLett.107.037201
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present experimental data and a theoretical interpretation of the conductance near the metalinsulator transition in thin ferromagnetic Gd films of thickness b approximate to 2-10 nm. A large phase relaxation rate caused by scattering of quasiparticles off spin-wave excitations renders the dephasing length L phi less than or similar to b in the range of sheet resistances considered, so that the effective dimension is d = 3. The conductivity data at different stages of disorder obey a fractional power-law temperature dependence and collapse onto two scaling curves for the metallic and insulating regimes, indicating an asymmetric metal-insulator transition with two distinctly different critical exponents; the best fit is obtained for a dynamical exponent z approximate to 2.5 and a correlation (localization) length critical exponent v_ approximate to 1: 4 (v(+) approximate to 0.8) on the metallic (insulating) side.
引用
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页数:4
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