Thin Film Thickness and Refractive Index Measurement by Multiple Beam Interferometry

被引：0

作者：

Chen, T. Y. ^{[1
]}

Lin, Y. J. ^{[1
]}

Hu, S. G. ^{[1
]}

Yang, S. L. ^{[1
]}

Chung, J. C. ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Dept Mech Engn, Tainan 701, Taiwan

来源：

FOURTH INTERNATIONAL CONFERENCE ON EXPERIMENTAL MECHANICS | 2010年 / 7522卷

关键词：

Thin film; Refractive index; Multiple Beam Interferometry; Fringe of Equal Chromatic Order(FECO);

D O I：

10.1117/12.854796

中图分类号：

O3 [力学];

学科分类号：

08 ; 0801 ;

摘要：

The materials will show remarkable different characteristics and phenomenon in the nano-scale. It has become unlackable to build and use precise measurement technologies and systems to understand and control the material characteristics. In this paper, a primary surface force apparatus to measure the thickness and refractive index of thin film is developed based on the multiple beam interferometriy. Using the symmetrical three-layer formula from Israelachvili, a software is designed to analyze the Fringe of Equal Chromatic Order (FECO) produced from multiple beam interferometry. Test of the system on the the experimental FECO is shown. The applicability of the system is validated. Further discussion of the factors that affect the formation of FECO is given.

引用

页数：6

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