Delta-doping of Si in GaN by metalorganic chemical vapor deposition

Si delta-doping in the GaN layer has been successfully demonstrated by metalorganic chemical vapor deposition. From the capacitance-voltage measurement, a sharp carrier concentration profile with a full width at half-maximum of 4.1 nm has been achieved with a peak concentration of 9.8 x 10(18) cm(-3). Si delta-doping concentration increases and then decreases with an increase in delta-doping time, and the use of a post-purge step in the ammonia ambient reduces Si delta-doping concentration. This indicates that delta-doping concentration is limited by the Si desorption process due to high growth temperatures.