Influence of reactive surface groups on the deposition of oxides thin film by atomic layer deposition

被引:16
作者
Edy, Riyanto [1 ,2 ]
Huang, Gaoshan [2 ]
Zhao, Yuting [2 ]
Guo, Ying [3 ]
Zhang, Jing [3 ]
Mei, Yongfeng [2 ]
Shi, Jianjun [3 ]
机构
[1] Donghua Univ, Coll Mat Sci & Engn, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China
[2] Fudan Univ, Dept Mat Sci, Shanghai 200433, Peoples R China
[3] Donghua Univ, Coll Sci, Shanghai 201620, Peoples R China
关键词
Atomic layer deposition; Reactive surface groups; Thin film; ORIENTED POLYMER-FILMS; BARRIER PROPERTIES; AL2O3; FILMS; ALUMINUM; GROWTH;
D O I
10.1016/j.surfcoat.2017.09.047
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this study, polyethylene terephthalate (PET) substrate was successfully coated Al2O3 and TiO2 films by atomic layer deposition (ALD). The experiment results demonstrate that the Al(2)O(3)3 can be deposited more efficiently than TiO2 on PET substrates. Further characterization on the coated substrates reveals that the density of hydroxyl OH groups play a significant role on the growth of the oxides ALD film. Chemical composition of the coated substrates is characterized by X-ray photoelectron spectroscopy, which shows that the C=0 elements are replaced by the Al - related elements in the Al2O3 - coated PET and the Ti - related elements in the TiO2 - coated PET. The results demonstrate that the C=0 has a strongly contribution to facilitate the initial ALD growth of the oxides thin films.
引用
收藏
页码:149 / 154
页数:6
相关论文
共 34 条
[1]   Effects of different laser and plasma treatments on the interface and adherence between evaporated aluminium and polyethylene terephthalate films: X-ray photoemission, and adhesion studies [J].
Ardelean, H ;
Petit, S ;
Laurens, P ;
Marcus, P ;
Arefi-Khonsari, F .
APPLIED SURFACE SCIENCE, 2005, 243 (1-4) :304-318
[2]  
Christ B.V., 2005, HDB MONOCHROMATIC XP
[3]  
Edy R., 2017, J MAT SCI ENG, V2017
[4]   TiO2 nanosheets synthesized by atomic layer deposition for photocatalysis [J].
Edy, Riyanto ;
Zhao, Yuting ;
Huang, Gaoshan S. ;
Shi, Jianjun J. ;
Zhang, Jing ;
Solovev, Alexander A. ;
Mei, Yongfeng .
PROGRESS IN NATURAL SCIENCE-MATERIALS INTERNATIONAL, 2016, 26 (05) :493-497
[5]   Atomic layer deposition of TiO2-nanomembrane-based photocatalysts with enhanced performance [J].
Edy, Riyanto ;
Huang, Gaoshan ;
Zhao, Yuting ;
Zhang, Jing ;
Mei, Yongfeng ;
Shi, Jianjun .
AIP ADVANCES, 2016, 6 (11)
[6]   Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition [J].
Edy, Riyanto ;
Huang, Xiaojiang ;
Guo, Ying ;
Zhang, Jing ;
Shi, Jianjun .
NANOSCALE RESEARCH LETTERS, 2013, 8
[7]   Atomic layer deposition of Al2O3 films on polyethylene particles [J].
Ferguson, JD ;
Weimer, AW ;
George, SM .
CHEMISTRY OF MATERIALS, 2004, 16 (26) :5602-5609
[8]   Atomic Layer Deposition: An Overview [J].
George, Steven M. .
CHEMICAL REVIEWS, 2010, 110 (01) :111-131
[9]   Directed inorganic modification of bi-component polymer fibers by selective vapor reaction and atomic layer deposition [J].
Gong, Bo ;
Spagnola, Joseph C. ;
Arvidson, Sara A. ;
Khan, Saad A. ;
Parsons, Gregory N. .
POLYMER, 2012, 53 (21) :4631-4636
[10]   Low-temperature Al2O3 atomic layer deposition [J].
Groner, MD ;
Fabreguette, FH ;
Elam, JW ;
George, SM .
CHEMISTRY OF MATERIALS, 2004, 16 (04) :639-645