Lateral Control of Indium Content and Wavelength of III-Nitride Diode Lasers by Means of GaN Substrate Patterning

被引:26
作者
Sarzynski, Marcin [1 ,2 ]
Suski, Tadeusz [1 ]
Staszczak, Grzegorz [1 ]
Khachapuridze, Aleksander [1 ]
Domagala, Jaroslaw Z. [3 ]
Czernecki, Robert [1 ,2 ]
Plesiewicz, Jerzy [2 ]
Pawlowska, Joanna [2 ]
Najda, Stephen P. [2 ]
Bockowski, Michal [1 ,2 ]
Perlin, Piotr [1 ,2 ]
Leszczynski, Michal [1 ,2 ]
机构
[1] Inst High Pressure Phys PAS, PL-01142 Warsaw, Poland
[2] TopGaN Ltd, PL-01142 Warsaw, Poland
[3] Inst Phys PAS, PL-02668 Warsaw, Poland
关键词
INGAN QUANTUM-WELLS; MISORIENTATION; LAYERS;
D O I
10.1143/APEX.5.021001
中图分类号
O59 [应用物理学];
学科分类号
摘要
A patterned GaN/sapphire template with separate regions angled between 0.4 and 2 degrees to the wurtzite c-plane was used to grow a 50nm In0.1Ga0.9N layer. The photoluminescence wavelength varied between 403 and 389nm according to the increased region's angle. The indium content measured using X-rays was reduced in regions with a higher miscut angle. Patterned freestanding GaN with separate regions angled by 0.35 and 0.85 degrees to the c-plane was used to fabricate ridge-waveguide diode lasers. Each laser stripe was placed inside one of the angled regions. Lasing wavelengths of 405.8+/-0.2 and 401.0+/-1nm were obtained for devices grown in those regions. (C) 2012 The Japan Society of Applied Physics
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页数:3
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