On the temperature dependent dielectric properties, conductivity and resistivity of MIS structures at 1 MHz

被引:45
作者
Eroglu, A. [1 ]
Tataroglu, A. [1 ]
Altindal, S. [1 ]
机构
[1] Gazi Univ, Dept Phys, Fac Arts & Sci, TR-06500 Ankara, Turkey
关键词
MIS structure; Dielectric properties; Ac conductivity; Ac resistivity; Electric modulus; SCHOTTKY DIODES; VOLTAGE CHARACTERISTICS; METAL-SEMICONDUCTOR; INTERFACE STATES; THIN-FILMS; FREQUENCY; INSULATOR; BARRIER; OXIDE; CAPACITANCE;
D O I
10.1016/j.mee.2011.07.016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, the temperature dependence of the dielectric properties, conductivity and resistivity of metal-insulator-semiconductor (MIS) structures have been investigated using capacitance (C) and conductance (G/omega) measurements in wide temperature range of 120-400 K at 1 MHz. Calculation of the dielectric constant (epsilon'), dielectric loss (epsilon ''). loss tangent (tan delta), ac conductivity (sigma(ac)), ac resistivity (rho(ac)) and the real and imaginary parts of electric modulus (M' and M '') were given in the studied temperature range. The values of the epsilon', epsilon '' and sigma(ac) increase exponentially with the increasing temperature between 280 K and 400 K. On the other hand, these values remain almost constant between 120 K and 240 K. In addition, the experimental dielectric data have been analyzed by considering electric modulus formalism. The In sigma(ac) vs. 1000/T plot shows two linear regions with different slopes which correspond to low (120-240 K) and high (280-400 K) temperature ranges. The values of activation energy for two different conduction mechanisms were found as 4 meV and 201 meV for low and high temperature ranges, respectively. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:154 / 158
页数:5
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