Structure and mobility on amorphous silicon surfaces

被引:8
|
作者
Dalton, AS [1 ]
Seebauer, EG [1 ]
机构
[1] Univ Illinois, Dept Chem Engn, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
surface diffusion; surface structure; morphology; roughness; and topography; amorphous surfaces; silicon; molecular dynamics;
D O I
10.1016/j.susc.2003.12.033
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structure and dynamics of amorphous surfaces are poorly understood. The present work develops methods employing classical molecular dynamics (MD) simulations to elucidate these phenomena on amorphous silicon. Careful relaxation of the initial ensemble and taking account of exchange with the bulk yield surface diffusion coefficients in good agreement with experiment. Randomly oriented dimer pairs dominate the surface structure. Diffusion proceeds by several pathways, which all differ in basic character from those typically observed on crystalline silicon. The primary pathways involve single atoms and dimer pairs, which typically move only one or two atomic diameters before reincorporating into the surface. Frequent vertical migration takes place between the first two atomic layers. (C) 2003 Published by Elsevier B.V.
引用
收藏
页码:140 / 148
页数:9
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