Structural and functional stabilities of artificially designed DNA ultra-thin films grown by silica Assistance

被引：4
作者：
Lee, Junwye [1 ,2 ]
Koo, Jonghyun [1 ,3 ]
Hwang, Si Un [1 ,2 ]
Min, Sunmin [1 ,3 ]
Ahn, Sang Jung [4 ]
Roh, Yonghan [1 ,3 ]
Park, Sung Ha [1 ,2 ]
机构：
[1] Sungkyunkwan Univ, Sungkyunkwan Adv Inst Nanotechnol SAINT, Suwon 440746, South Korea
[2] Sungkyunkwan Univ, Dept Phys, Suwon 440746, South Korea
[3] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, South Korea
[4] Korea Res Inst Stand & Sci, Taejon 305340, South Korea
来源：
CURRENT APPLIED PHYSICS | 2012年 / 12卷 / 04期
基金：
新加坡国家研究基金会;
关键词：
DNA; Nanotechnology; Thin film; DNA nanostructure; Stability; TRANSITION; CONDENSATION; CRYSTALS;
D O I：
10.1016/j.cap.2012.02.061
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report the structural and functional stabilities of artificially synthesized DNA ultra-thin films. Fully covered DNA ultra-thin films on a silica substrate were fabricated by the silica-assisted growth method and those samples were then incubated in various chemicals and physical conditions. The DNA ultra-thin films showed high maintainability under those harsh conditions and these results would aid to facilitate the use of artificial DNA ultra-thin films in advanced research areas such as biophotonics and bioelectronics. (c) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码：1207 / 1211
页数：5
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